fabrication of copper and iron nano/micro structures on semiconducting substrate and their electrical characterization

in this paper, we have studied the electrical properties of the randomly distributed metallic (co and fe) nano/ micro wires on silicon substrate. deposition was carried out potentiostatically into the pores of the track-etch polycarbonate membrane spin coated onto the si substrate. spin coated films were irradiated with 150mev ni (+11) ions at a fluence of 8e7 ions/cm2, followed by uv irradiation and chemically etching in aqueous naoh (6n, at room temperature). the size, shape and morphology of the synthesized nano/micro structures is strongly dependent on the preparation conditions such as deposition potential, current density, electrolyte and etching conditions. later, morphological and electrical properties of the so deposited nano-/micro structureswere studied.